Advances in characterizing SiON for 0.18-and 0.25-ｦﾌm technologies

Advances in characterizing SiON for 0.18-and 0.25-ｦﾌm technologies

著者名:

Forouhi,A.R. ( n&k Technology,Inc. )
Li,G.G. ( n&k Technology,Inc. )
Bloomer,I. ( n&k Technology,Inc. )

掲載資料名:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3332

発行年:

1998

開始ページ:

493

終了ページ:

500

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

言語:

英語

請求記号:

P63600/3332

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018777
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
回次:	1998 : 12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

類似資料:

1 国際会議録 Lithographic evaluation of deep-UV photoresists for 0.25-and 0.18-ｦﾌm technology design rules Amblard,G.R. SPIE-The International Society for Optical Engineering	7 国際会議録 Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ｦﾌm-generation advanced mask fabrication Tsai,W., Chen,F., Kamna,M., Chegwidden,S., Labovitz,S.M., Farnsworth,J.N., Dao,G.T. SPIE-The International Society for Optical Engineering
2 国際会議録 Characterization of gate electrode etch process for 0.25 ｦﾌm extended to 0.18 ｦﾌm Gerung,H., Chhagan,V.K., Yelehanka,P.R., Zhou,M.S., Hui,J.K.L. SPIE - The International Society for Optical Engineering	8 国際会議録 Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ｦﾌm Technology Venkatraman, R., Jain, A., Farkas, J., Mendonca, J., Hamilton, G., Capasso, C., Denning, D., Simpson, C., Rogers, B., … MRS - Materials Research Society
3 国際会議録 Integrated Rapid Thermal CVD Processing Solutions For 0.18-0.25 ｦﾌm Technologies Gilboa, H., Gilboa, Y. E., Atzmon, Z., Levy, S., Spilberg, H., Bransky, E., Doitel, Z., Thakur, R. P. S., Weimer, R. A., … MRS - Materials Research Society	9 国際会議録 0.50-ｦﾌm pitch metal integration in 0.18-ｦﾌm technology DeBord,J.R.D., Jayaraman,V., Hewson,M.M., Lee,W.W., Ilzhoefer,J.R. SPIE-The International Society for Optical Engineering
4 国際会議録 Evaluation of the Electromigration Performance of New Aluminum Via Plug-Fill Techniques for 0.25ｦﾌm and 0.18ｦﾌm Technologies Foley, S., Tung, N. Chan, Gounelle, C., Wyborn, G., Louwers, S., Mathewson, A. MRS - Materials Research Society	10 国際会議録 Optical characterization of ITO films used in flat panel displays Forouhi,A.R., Li,G.G., Bloomer,I. SPIE-The International Society for Optical Engineering
5 国際会議録 Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology Kizilyalli,I.C., Huang,R.Y., Hwang,D., Kane,B.C., Ashton,R., Kuehne,S., Deng,X., Twiford,M.S., Martin,E.P., … SPIE-The International Society for Optical Engineering	11 国際会議録 Mechanical Stresses in Aluminum and Copper Interconnect Lines for 0.18 ｦﾌm Logic Technologies Besser, P. R., Joo, Y-C., Winter, D., Ngo, M. Van, Ortega, R. MRS - Materials Research Society
6 国際会議録 Line-edge roughness in sub-0.18-ｦﾌm resist patterns Palmateer,S.C., Cann,S.G., Curtin,J.E., Doran,S.P., Eriksen,L.M., Forte,A.R., Kunz,R.R., Lyszczarz,T.M., Stern,M.B., … SPIE-The International Society for Optical Engineering	12 国際会議録 Mask technology for 0.18-ｦﾌm device generation Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12