Blank Cover Image

Advanced surface inspection techniques for SOI wafers

著者名:
掲載資料名:
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3332
発行年:
1998
開始ページ:
488
終了ページ:
492
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427779 [0819427772]
言語:
英語
請求記号:
P63600/3332
資料種別:
国際会議録

類似資料:

1 国際会議録 Advanced inspection technique for deep-submicron and high-aspect-ratio contact holes

Matsui, M., Nozoe, M., Arauchi, K., Takafuji, A., Nishiyama, H., Goto, Y.

SPIE-The International Society for Optical Engineering
7 国際会議録 A WAFER BONDED - SOI BIPOLAR TRANSISTOR

T. Sakakibara, T. Sugisaka, S. Miura, M. Iida, O. Ishihara

Electrochemical Society
2 国際会議録 High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Liu, L., Liao, C.-H., Dai, Y.-M., Lin, J.-C., Bhattacharyya, K., Huang, Y.-T., Son, K., Wang, D.

SPIE - The International Society of Optical Engineering
8 国際会議録 Wafer plane inspection for advanced reticle defects

R. Nagpal, F. Ghadiali, J. Kim, T. Huang, S. Pang

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Direct Wafer Bonding Technique of Ferroelectric Single

Tomita, Crystals Y., Sugimoto, M., Eda, K.

Electrochemical Society
9 国際会議録 Extendibility of laser scanning tools for advanced wafer inspection

B.M. Trafas, M. Nikoonahad, K.B. Wells, R. Johnson, S.E. Stokowski

Society of Photo-optical Instrumentation Engineers
4 国際会議録 SOI Wafers with Buried Cavities

Suni, T., Henttinen, K., Dekker, J., Luoto, H., Kulawski, M., Makinen, J., Mutikainen, R.

Electrochemical Society
10 国際会議録 Open-contact failure detection of via holes by using voltage contrast

Nishiyama,H., Nozoe,M., Aramaki,K., Watanabe,O., Ikeda,Y.

SPIE-The International Society for Optical Engineering
5 国際会議録 Lot acceptance sampling inspection pion for non-normal CD distribution

T. Ikeda, M. Asano

Society of Photo-optical Instrumentation Engineers
11 国際会議録 Implant Metrology for Bonded SOI Wafers using a Surface Photo-Voltage Technique

A. F. Bertuch, W. Smith, K. Steeples, R. Standley, A. Stefanescu, R. Johnson

Electrochemical Society
6 国際会議録 Surface inspection of patterned wafer based on 2D wavelet transform

Zhao, M.T., Dumoulin, L.

SPIE-The International Society for Optical Engineering
12 国際会議録 Analyses of Au/Si Schottky Barrier-Induced AC Surface Photovoltages in N-Type Silicon Wafers Rinsed in Au Aqueous Solution

H. Shimizu, E. Omori, M. Ikeda

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12