Control and modeling of stress in multistacked polysilicon films considering oxidation effect
- 著者名:
Lee,C.S. ( Electronics and Telecommunications Research Institute (Korea) ) Jang,W.I. ( Electronics and Telecommunications Research Institute (Korea) ) Choi,C.A. ( Electronics and Telecommunications Research Institute (Korea) ) Hong,Y.S. ( Electronics and Telecommunications Research Institute (Korea) ) Lee,J.H. ( Electronics and Telecommunications Research Institute (Korea) ) No,K. ( Korea Advanced Institute of Science and Technology ) Wee,D.M. ( Korea Advanced Institute of Science and Technology ) - 掲載資料名:
- Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3511
- 発行年:
- 1998
- 開始ページ:
- 315
- 終了ページ:
- 324
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429704 [0819429708]
- 言語:
- 英語
- 請求記号:
- P63600/3511
- 資料種別:
- 国際会議録
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6
国際会議録
Formation of low-stress multilayered thick polysilicon films for fabrication of microsystems
SPIE-The International Society for Optical Engineering |
Electrochemical Society |