Generation mechanism and reduction methods of post-passivation-etch silklike polymers

Generation mechanism and reduction methods of post-passivation-etch silklike polymers

著者名:

Young,C.-D. ( Taiwan Semiconductor Manufacturing Co. )
Chen,S.-F.
Chen,C.-H.

掲載資料名:

Process and equipment control in microelectronic manufacturing : 19-20 May 1999, Edinburgh, Scotland

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3742

発行年:

1999

開始ページ:

180

終了ページ:

185

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819432223 [0819432229]

言語:

英語

請求記号:

P63600/3742

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018547
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing Technologies : Process and Wquipment Control in Microelectronic Manufacturin
回次:	1999
会議開催地:	Edinburgh, Scotland
会議開催年:	1999.05.19-1999.05.20

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