Advanced refractory-metal and process technology for the fabrication of x-ray masks

Advanced refractory-metal and process technology for the fabrication of x-ray masks

著者名:

Brooks,C.J. ( IBM Microelectronics Div. )
Racette,K.C.
Lercel,M.J.
Powers,L.A.
Benoit,D.E.

掲載資料名:

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3676

発行年:

1999

巻:

Part1

開始ページ:

14

終了ページ:

23

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431509 [0819431508]

言語:

英語

請求記号:

P63600/3676

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018541
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	1999 : 3rd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

類似資料:

1 国際会議録 Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication Brooks,C.J., Benoit,D.E., Racette,K.C., Puisto,D.M., Whig,R., Dauksher,W.J., Cummings,K.D. SPIE-The International Society for Optical Engineering	7 国際会議録 Status of x-ray mask development at the IBM Advanced Mask Facility Racette,K.C. SPIE-The International Society for Optical Engineering
2 国際会議録 EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering	8 国際会議録 Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks Racette,K.C., Williams,C.T., Lercel,M.J. SPIE-The International Society for Optical Engineering
3 国際会議録 UVN2-negative chemically amplified resist optimization for x-ray mask fabrication Rocque,J.M., Lercel,M.J., Brooks,C.J., Henry,R.W., Benoit,D.E. SPIE - The International Society for Optical Engineering	9 国際会議録 Next-generation lithography mask development at the NGL-MCOC Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L. SPIE - The International Society for Optical Engineering
4 国際会議録 Next-generation lithography mask development at the NGL Mask Center of Competency Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., … SPIE - The International Society for Optical Engineering	10 国際会議録 Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering
5 国際会議録 Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J. SPIE-The International Society for Optical Engineering	11 国際会議録 EPL mask fabrication Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E. SPIE-The International Society for Optical Engineering
6 国際会議録 Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering	12 国際会議録 Imaging capabilities of proximity x-ray lithography at 70-nm ground rules Krasnoperova,A.A., Rippstein,R.P., Flamholz,A.L., Kratschmer,E., Wind,S., Brooks,C.J., Lercel,M.J. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12