Experiments in mask metrology using a CD AFM

Experiments in mask metrology using a CD AFM

著者名:

Klos,M.A. ( IBM Corp. )
Yedur,S.K.

掲載資料名:

Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3998

発行年:

2000

開始ページ:

350

終了ページ:

361

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436160 [081943616X]

言語:

英語

請求記号:

P63600/3998

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018514
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2000 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.02

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