Process-induced defects in sub-0.15-ヲフm device patterning using 193-nm lithography
- 著者名:
- Okoroanyanwu,U. ( Advanced Micro Devices,Inc. )
- Pike,C.
- Levinson,H.J.
- 掲載資料名:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3998
- 発行年:
- 2000
- 開始ページ:
- 277
- 終了ページ:
- 283
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- 言語:
- 英語
- 請求記号:
- P63600/3998
- 資料種別:
- 国際会議録
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SPIE - The International Society for Optical Engineering |
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SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
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SPIE - The International Society for Optical Engineering |