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Optimal design of reactors for metalorganic vapor phase epitaxy of group III nitrides

著者名:
Pawlowski, R. P.
Theodoropoulos, C.
Mountziaris, T. J.
Moffat, H. K.
Han, J.
Thrush, E. J.
さらに 1 件
掲載資料名:
New methods, mechanisms and models of vapor deposition : symposium held April 24-26, 2000, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
616
発行年:
2000
開始ページ:
159
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995246 [1558995242]
言語:
英語
請求記号:
M23500/616
資料種別:
国際会議録

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