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The influence of clusters on vapor-deposited thin films: Atomistic simulations

著者名:
掲載資料名:
New methods, mechanisms and models of vapor deposition : symposium held April 24-26, 2000, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
616
発行年:
2000
開始ページ:
129
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995246 [1558995242]
言語:
英語
請求記号:
M23500/616
資料種別:
国際会議録

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