SIMOX MATERIAL DEVELOPMENT FOR SUB-0.25ｦﾌm CMOS TECHNOLOGY

SIMOX MATERIAL DEVELOPMENT FOR SUB-0.25ｦﾌm CMOS TECHNOLOGY

著者名:

掲載資料名:

Materials synthesis and processing using ion beams : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

316

発行年:

1994

開始ページ:

699

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992153 [1558992154]

言語:

英語

請求記号:

M23500/316

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018464
シリーズID:	PA00000011
会議名:	Symposium on materials synthesis and processing using ion beams
回次:	1993
会議開催地:	Boston, MA, USA
会議開催年:	1993.11.29-1993.12.03

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