Blank Cover Image

MODELING OF DOPANT DIFFUSION DURING ANNEALING OF SUB-AMORPHIZING IMPLANTS

著者名:
Dunham, Scott  
掲載資料名:
Materials synthesis and processing using ion beams : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
316
発行年:
1994
開始ページ:
197
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992153 [1558992154]
言語:
英語
請求記号:
M23500/316
資料種別:
国際会議録

類似資料:

Gencer, Alp H., Dunham, Scott T.

MRS - Materials Research Society

Banerice, S., Dunham, S.T.

Electrochemical Society

Gencer, Alp H., Dunham, Scott T.

MRS - Materials Research Society

Felch, S.B., Graoui, H., Mayur, A.

Electrochemical Society

Kagadei, V.A., Markov, A.B.

SPIE - The International Society of Optical Engineering

Fastenko, Pavel, Dunham, Scott T., Henkelman, Graeme

Materials Research Society

Banerjee, S., Dunham, S. T.

Electrochemical Society

10 国際会議録 DOPANT DIFFUSION IN POLYSILLCON

Matsuoka, M.A., Dunham, S.T.

Electrochemical Society

Dunham, S. T., Wittel, F.

Electrochemical Society

Hsiu-Wu Guo, Scott T. Dunham

Materials Research Society

Dunham, S.T., Wittel, F.

Electrochemical Society

Chihak Ahn, Jakyoung Song, Scott T. Dunham

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12