MASK TECHNOLOGY FOR X-RAY NANOLITHOGRAPHY
- 著者名:
Schattenburg, M. L. Carter, J. Chu, W. Fleming, R. C. Ghanbari, R. A. Mondol, M. Polce, N. Smith, Henry I. - 掲載資料名:
- Materials aspects of x-ray lithography : symposium held April 12-14, 1993, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 306
- 発行年:
- 1993
- 開始ページ:
- 63
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992023 [1558992022]
- 言語:
- 英語
- 請求記号:
- M23500/306
- 資料種別:
- 国際会議録
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