Investigations of the Low Dielectric Constant Fluorinated Polyimide for Use as the Interlayer Dielectric in ULSI

Investigations of the Low Dielectric Constant Fluorinated Polyimide for Use as the Interlayer Dielectric in ULSI

著者名:

掲載資料名:

Low-dielectric constant materials : synthesis and applications in microelectronics : symposium held April 17-19, 1995, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

381

発行年:

1995

開始ページ:

31

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992849 [1558992847]

言語:

英語

請求記号:

M23500/381

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018462
シリーズID:	PA00000011
会議名:	Symposium on low-dielectric constant materials-synthesis and applications in microelectronics
回次:	1995
会議開催地:	San Francisco, CA, USA
会議開催年:	1995.04.17-1995.04.19

類似資料:

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2 国際会議録 POLYIMIDES AND COPOLYIMIDES WITH LOW DIELECTRIC CONSTANT, LOW MOISTURE AND ABSORPTION, AND LOW COEFFICIENT OF THERMAL EXPANSION FOR USE AS INTERLAYER … Auman, Brian C. MRS - Materials Research Society	8 国際会議録 Stiff, Fluorinated Polyimides for Electronics Applications Auman B. Society of Plastics Engineers, Inc. (SPE)
3 国際会議録 Reaction Between Low-Dielectric-Constant Fluorinated Polyimide and Aluminum Tong, H. Y., Szalkowski, F. J., Shi, F. G., Zhao, B., Brongo, M., Wang, S-Q., Vasudev, P. K. MRS - Materials Research Society	9 国際会議録 SiLK Polymer Coating With Low-Dielectric Constant and High Thermal Stability for ULSI Interlayer Dielectric Townsend, P. H., Martin, S. J., Godschalx, J., Romer, D. R., Smith, D. W., Jr., Castillo, D., DeVries, R., Buske, G., … MRS - Materials Research Society
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