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Low-Temperature Epitaxy of Si/Si1-xGex/Si Multilayers by Low-Pressure RTCVD for Very Thin SOI Applications

著者名:
掲載資料名:
Epitaxy and applications of si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
533
発行年:
1998
開始ページ:
307
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994393 [1558994394]
言語:
英語
請求記号:
M23500/533
資料種別:
国際会議録

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