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Toward rf System-Level Integration: Process Integration Issues in SiGe BiCMOS

著者名:
Freeman, G.
Schonenberg, K.
Ahlgren, D.
Jeng, S-J.
Nguyen-Ngoc, D.
Stein, K.
Colavito, D.
Subbanna, S.
Harame, D.
Meyerson, B.
さらに 5 件
掲載資料名:
Epitaxy and applications of si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
533
発行年:
1998
開始ページ:
19
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994393 [1558994394]
言語:
英語
請求記号:
M23500/533
資料種別:
国際会議録

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