Electron Microscopic Studies of Co- and Ti-Germanosilicide Films Formed on SiGe Layers

Electron Microscopic Studies of Co- and Ti-Germanosilicide Films Formed on SiGe Layers

著者名:

掲載資料名:

Electron microscopy of semiconducting materials and ULSI devices : symposium held Aprl 15-16, 1998, San Francisco, California, U. S. A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

523

発行年:

1998

開始ページ:

133

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994294 [1558994297]

言語:

英語

請求記号:

M23500/523

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018458
シリーズID:	PA00000011
会議名:	Symposiujm on electron microscopy of semiconducting materials and ULSI devices
回次:	1998
会議開催地:	San Francisco, California, USA
会議開催年:	1998.04.15-1998.04.16

類似資料:

1 国際会議録 Microstructural Studies of Co Silicide Layers Formed on SiGe and SiGeC Jin, S., Bender, H., Donaton, R. A., Maex, K., Vantomme, A., Langouche, G., Amour, A. St., Sturm, J. C. MRS - Materials Research Society	7 国際会議録 Titanium Silicidation and Secondary Defect Annihilation in Ion Beam Processed SiGe Layers Larsen, K. Kyllesbech, Via, F. La, Lombardo, S., Raineri, V., Donaton, R. A., Campisano, S. U. MRS - Materials Research Society
2 国際会議録 Influence of SiGe Thickness on the Co/SiGe/Si Solid State Reaction Donaton, R. A., Jin, S., Bender, H., Maex, K., Vantomme, A., Langouche, G. MRS - Materials Research Society	8 国際会議録 Structural and Electrical Characterization of FeSix-Layers (1｡蛉｡？) Prepared by RTP of Fe Layers Sputtered on Si (100) Libezny, M., Poortmans, J., Amesz, P. H., Donaton, R. A., Larsen, K. Kyllesbech, Vandenabeele, P., Jonckx, F., Maex, K., … MRS - Materials Research Society
3 国際会議録 The Influence of Ti Capping Layers on CoSi2 Formation in the Presence of Interfacial Oxide Detavernier, C., Donaton, R. A., Maex, K., Jin, S., Bender, H., Meirhaeghe, R. Van, Cardon, F. MRS - Materials Research Society	9 国際会議録 CoSi₂/Si_1-xGe_x interfaces for Schottky barrier infrared detectors with extended detection regime S. Kolodinski, R.A. Donaton, E. Roca, M. Caymax, K. Maex Society of Photo-optical Instrumentation Engineers
4 国際会議録 New Approaches for Formation of Ultra-Thin PtSi Layers for Infrared Applications Donaton, R. A., Jin, S., Bender, H., Zagrebnov, M., Baert, K., Maex, K., Vantomme, A., Langouche, G. MRS - Materials Research Society	10 国際会議録 Curing Study Of Hydrogen Silsesquioxane Under H2N2 Ambient Donaton, R.A., Coenegrachts, B., Sleeckx, E., Schaekers, M., Sophie, G., Matsuki, N., Baklanov, M.R., Struyf, H., … Materials Research Society
5 国際会議録 Characterization of Ultra-Thin PtSi Films for Infrared Detectors Bender, H., Roussel, P., Kolodinski, S., Torres, A., Donaton, R. A., Maex, K., Sluis, P. Van der MRS - Materials Research Society	11 国際会議録 A BEEM Study of PtSi Schottky Contacts on Ion-Milled Si Ru, G-P., Detavernier, C., Donaton, R. A., Blondeel, A., Clauws, P., Meirhaeghe, R. L. Van, Cardon, F., Maex, K., Qu, … MRS - Materials Research Society
6 国際会議録 New process for the controlled formation of ultrathin PtSi films for infrared detector applications A. Torres, S. Kolodinski, R.A. Donaton, K. Maex, P. Roussel Society of Photo-optical Instrumentation Engineers	12 国際会議録 Electron Microscopic Study of Nodules Formed during Electrodeposition of Copper on Aluminium A. Augustin, K.U. Bhat, K.R. Udupa, A.C. Hegde Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12