Deposition of Thin SiO2 Films on Polymers as a Hard-Coating Using a Microwave-ECR Plasma
- 著者名:
Sano, K. Tamamaki, H. Nomura, M. Wickramanayaka, S. Nakanishi, Y. Hatanaka, Y. - 掲載資料名:
- Microwave processing of materials V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 430
- 発行年:
- 1996
- 開始ページ:
- 647
- 出版情報:
- Pittsburgh,, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993334 [1558993339]
- 言語:
- 英語
- 請求記号:
- M23500/430
- 資料種別:
- 国際会議録
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