Simulations of Si(100) Growth: Step Flow and Low Temperature Growth

Simulations of Si(100) Growth: Step Flow and Low Temperature Growth

著者名:

掲載資料名:

Evolution of epitaxial structure and morphology : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

399

発行年:

1996

開始ページ:

511

出版情報:

Pittsburgh, Pennsylvania: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993020 [1558993029]

言語:

英語

請求記号:

M23500/399

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018446
シリーズID:	PA00000011
会議名:	Symposium on evolution of epitaxial structure and morphology
回次:	1995
会議開催地:	Boston, MA, USA
会議開催年:	1995.11.27-1995.12.01

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