FIB repair of opaque defects for 64-Mb-DRAM-level binary masks
- 著者名:
Lee,K.H. ( Samsung Electronics Co.Ltd. ) Cho,H.K. Park,J.H. Kim,Y.H. Yoon,H.S. Sohn,J.M. - 掲載資料名:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2884
- 発行年:
- 1996
- 開始ページ:
- 442
- 終了ページ:
- 453
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- 言語:
- 英語
- 請求記号:
- P63600/2884
- 資料種別:
- 国際会議録
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