Chemically amplified resist process for 0.25-ヲフm-generation photomasks
- 著者名:
- Katsumata,M. ( Sony Corp. )
- Kawahira,H.
- Sugawara,M.
- Nozawa,S.
- 掲載資料名:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2884
- 発行年:
- 1996
- 開始ページ:
- 83
- 終了ページ:
- 91
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- 言語:
- 英語
- 請求記号:
- P63600/2884
- 資料種別:
- 国際会議録
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