Plasma-induced charging damage in P+-Polysilicon PMOSFETs
- 著者名:
- Lu,I.M. ( Univ.of Texas at Austin )
- Chen,Y.Y. ( Univ.of Texas at Austin )
- Joshi,A.B. ( Rockwell Corp. )
- Kwong,D.L. ( Univ.of Texas at Austin )
- 掲載資料名:
- Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3212
- 発行年:
- 1997
- 開始ページ:
- 275
- 終了ページ:
- 282
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426444 [081942644X]
- 言語:
- 英語
- 請求記号:
- P63600/3212
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
2
国際会議録
Enhanced Degradation in P+-Poly PMOSFETs With Oxynitride Gate Dielectrics Under Hot-Hole Injection
MRS - Materials Research Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society | |
SPIE - The International Society for Optical Engineering |