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Wafer-scale modeling of pattern effect in oxide chemical mechanical polishing

著者名:
Ouma,D. ( Massachusetts Institute of Technology )
Stine,B. ( Massachusetts Institute of Technology )
Divecha,R. ( Massachusetts Institute of Technology )
Boning,D. ( Massachusetts Institute of Technology )
Chung,J. ( Massachusetts Institute of Technology )
Shinn,G.B. ( Texas Instruments Inc. )
Ali,I. ( Texas Instruments Inc. )
Clark,J. ( Texas Instruments Inc. )
さらに 3 件
掲載資料名:
Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3212
発行年:
1997
開始ページ:
236
終了ページ:
247
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426444 [081942644X]
言語:
英語
請求記号:
P63600/3212
資料種別:
国際会議録

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