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Impact of nitrogen ion implantation on deep submicron SALICIDE process

著者名:
Lim,C.W, ( National Univ.of Singapore )
Lahiri,S.K. ( National Univ.of Singapore )
Tung,C.H. ( Institute of Microelectronics(Singapore) )
Wong,S.M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Lee,K.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Wong,H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Pey,K.L. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Chan,L.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
さらに 3 件
掲載資料名:
Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3212
発行年:
1997
開始ページ:
151
終了ページ:
161
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426444 [081942644X]
言語:
英語
請求記号:
P63600/3212
資料種別:
国際会議録

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