Methods for the design of microelectronic devices and process flows for manufacturability

Methods for the design of microelectronic devices and process flows for manufacturability

著者名:

Saxena,S. ( Texas Instruments Inc. )

Burch,R. ( Texas Instruments Inc. )

Mozumder,P.K. ( Texas Instruments Inc. )

Vasanth,K. ( Texas Instruments Inc. )

Rao,S. ( Texas Instruments Inc. )

Davis,J. ( Texas Instruments Inc. )

Fernando,C. ( Texas Instruments Inc. )

さらに 2 件

掲載資料名:

Microelectronic Device Technology : 1-2 October 1997, Austin, Texas

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3212

発行年:

1997

開始ページ:

18

終了ページ:

23

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426444 [081942644X]

言語:

英語

請求記号:

P63600/3212

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018328
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Microelectronic Device Technology
回次:	1997
会議開催地:	Austin, TX, USA
会議開催年:	1997.10.01-1997.10.02

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1 国際会議録 A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using Source/Drain and Silicide Process Modules and Their Interactions Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K. MRS - Materials Research Society	7 国際会議録 AlGaAs MICROELECTRONIC DEVICE PROCESSING USING AN As CAPPING LAYER Grepstad, J. K., Husby, H., Bernstein, R. W., Fimland, B. -O. MRS - Materials Research Society
2 国際会議録 A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using S/D and Silicide Process Modules and Their Interactions Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K. MRS - Materials Research Society	8 国際会議録 Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
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4 国際会議録 Process Design and Integration of Salicide and Source/Drain Process Modules for Improved Device Performance Apte, Pushkar P., Saxena, Sharad, Rao, Suraj, Vasanth, Karthik, Prinslow, Douglas A., Kittl, Jorge A., Breedijk, … MRS - Materials Research Society	10 国際会議録 Material structure and processes required for the manufacture of micromechanical devices Skrobis,K.J., Christenson,J., Staller,S.E., Freeman,J., Gadgil,P. SPIE-The International Society for Optical Engineering
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6 国際会議録 Characterization and modeling of intradie variation and its applications to design for manufacturability Saxena, S., Guardiani, C., Quarantelli, M., Dragone, N., Minehane, S., McNamara, P., Babcock, J.A. SPIE-The International Society for Optical Engineering	12 国際会議録 LIGHT-EMITTING POROUS SILICON AFTER STANDARD MICROELECTRONIC PROCESSING Peng, C., Tsybeskov, L., Fauchet, P.M., Seiferth, F., Kurinec, S.K., Rehm, J.M., Mclendon, G.L. Materials Research Society

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