Line-edge roughness in sub-0.18-ヲフm resist patterns
- 著者名:
Palmateer,S.C. ( MIT Lincoln Lab. ) Cann,S.G. ( MIT Lincoln Lab. ) Curtin,J.E. ( MIT Lincoln Lab. ) Doran,S.P. ( MIT Lincoln Lab. ) Eriksen,L.M. ( MIT Lincoln Lab. ) Forte,A.R. ( MIT Lincoln Lab. ) Kunz,R.R. ( MIT Lincoln Lab. ) Lyszczarz,T.M. ( MIT Lincoln Lab. ) Stern,M.B. ( MIT Lincoln Lab. ) Nelson,C.M. ( Motorola and SEMATECH ) - 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 1
- 開始ページ:
- 634
- 終了ページ:
- 642
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |