Feasibility of a CVD-resist-based lithography process at 193-nm wavelength
- 著者名:
Lee,C.Y. ( Intel Corp. ) Das,S. ( Intel Corp. ) Yang,J. ( Intel Corp. ) Weidman,T.W. ( Applied Materials ) Sugiarto,D. ( Applied Materials ) Nault,M. ( Applied Materials ) Mui,D. ( Applied Materials ) Osborne,Z.A. ( Applied Materials ) - 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 1
- 開始ページ:
- 625
- 終了ページ:
- 633
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |