Improving the performance of 193-nm photoresists based on alicyclic polymers
- 著者名:
Patterson,K. ( Univ.of Texas at Austin ) Okoroanyanwu,U. ( Univ.of Texas at Austin ) Shimokawa,T. ( Univ.of Texas at Austin ) Cho,S. ( Univ.of Texas at Austin ) Byers,J.D. ( SEMATECH ) Willson,C.G. ( Univ.of Texas at Austin ) - 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 1
- 開始ページ:
- 425
- 終了ページ:
- 437
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
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6
国際会議録
Deprotection kinetics of alicyclic polymer resist systems designed for ArF(193nm) lithography
American Chemical Society |
SPIE-The International Society for Optical Engineering |