Application of plasma-polymerized methylsilane for 0.18-ヲフm photolithography
- 著者名:
Monget,C. ( France Telecom-CNET ) Lee,C.Y. ( Intel Corp. ) Joubert,O.P. ( France Telecom-CNET and CNRS-LPCM-IMN (France) ) Amblard,G.R. ( CNET/SGS-Thomson (France) ) Weidman,T.W. ( Applied Materials ) Sugiarto,D. ( Applied Materials ) Yang,J. ( Intel Corp. ) Cormont,F. ( France Telecom-CNET ) Inglebert,R.L. ( Univ.d'Orleans (France) ) - 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 1
- 開始ページ:
- 366
- 終了ページ:
- 375
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
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