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Deep-ultraviolet antireflective coating with improved conformality,optical density,and etch rate

著者名:
Guerrero,D.J. ( Brewer Science,Inc. )
Meador,J.D. ( Brewer Science,Inc. )
Xu,G. ( Brewer Science,Inc. )
Suzuki,H. ( Nissan Central Research Institute (Japan) )
Sone,Y. ( Nissan Central Research Institute (Japan) )
Krishnamurthy,V. ( Brewer Science Inc. )
Claypool,J. ( Brewer Science Inc. )
Lamb,III,J.E. ( Brewer Science Inc. )
さらに 3 件
掲載資料名:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3333
発行年:
1998
巻:
Part 1
開始ページ:
228
終了ページ:
235
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
言語:
英語
請求記号:
P63600/3333
資料種別:
国際会議録

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