Design and study of water-soluble positive- and negative-tone imaging materials

Design and study of water-soluble positive- and negative-tone imaging materials

著者名:

Havard,J.M. ( Univ.of California/Berkeley )

Pasini,D. ( Univ.of California/Berkeley )

Frechet,J.M.J. ( Univ.of California/Berkeley )

Medeiros,D.R. ( Univ.of Texas at Austin )

Patterson,K. ( Univ.of Texas at Austin )

Yamada,S. ( Univ.of Texas at Austin )

Willson,C.G. ( Univ.of Texas at Austin )

さらに 2 件

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

111

終了ページ:

121

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

類似資料:

1 国際会議録 Design of a positive-tone water-soluble resist Havard,J.M., Frechet,J.M.J., Pasini,D., Mar,B., Yamada,S., Medeiros,D.R., Willson,C.G. SPIE-The International Society for Optical Engineering	7 国際会議録 Resist materials for 157-nm microlithography: an update Willson,C.G., Tran,H.V., Trinque,B.C., Chiba,T., Yamada,S., Sanders,D.P., Connor,E.F., Grubbs,R.H., Klopp,J.M., … SPIE-The International Society for Optical Engineering
2 国際会議録 Positive- and negative-tone water-processable photoresists: a progress report Yamada,S., Medeiros,D.R., Patterson,K., Jen,W.-L.K., Rager,T., Lin,Q., Lenci,C., Byers,J.D., Havard,J.M., Pasini,D., … SPIE-The International Society for Optical Engineering	8 国際会議録 IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance Patel, K.S., Lawson, M.C., Varanasi, P.R., Medeiros, D.R., Wallraff, G.M., Brock, P.J., DiPietro, R.A., Nishimura, Y., … SPIE - The International Society of Optical Engineering
3 国際会議録 Design and preliminary studies of environmentally enhanced water-castable, water-developable positive tone resists: model and feasibility studies Havard, Jennifer M., Pasini, Dario, Frechet, Jean M.J., Medeiros, David, Yamada, Shintaro, Willson, C. Grant American Chemical Society	9 国際会議録 Structurally variable cyclopolymers with excellent etch resistance and their application to 193-nm lithography Klopp,J.M., Pasini,D., Frechet,J.M.J., Byers,J.D. SPIE - The International Society for Optical Engineering
4 国際会議録 New single-layer positive photoresists for 193-nm photolithography Okoroanyanwu,U., Shimokawa,T., Byers,J.D., Medeiros,D.R., Willson,C.G., Niu,Q.J., Frechet,J.M.J., Allen,R.D. SPIE-The International Society for Optical Engineering	10 国際会議録 Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists Niu,Q.J., Frechet,J.M.J., Okoroanyanwu,U., Byers,J.D., Willson,C.G. SPIE-The International Society for Optical Engineering
5 国際会議録 Design and study of aqueous processable positive-tone photoresists Yamada,S., Owens,J., Rager,T., Nielsen,M., Byers,J.D., Willson,C.G. SPIE - The International Society for Optical Engineering	11 国際会議録 Negative-tone 193-nm resists Cho,S., Heyden,A.Vander, Byers,J.D., Willson,C.G. SPIE - The International Society for Optical Engineering
6 国際会議録 Water-soluble resist for environmentally friendly lithography Lin,Q., Simpson,L.L., Steinhausler,T., Wilder,M., Willson,C.G., Havard,J., Frechet,J.M.J. SPIE-The International Society for Optical Engineering	12 国際会議録 Mesoscale simulation of positive tone chemically amplified photoresists Schmid, G.M., Burns, S.D., Stewart, M.D., Willson, C.G. SPIE-The International Society for Optical Engineering

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