Laser and thermal annealing of Co-implanted Si studied by Mossbauer spectroscopy

Laser and thermal annealing of Co-implanted Si studied by Mossbauer spectroscopy

著者名:

Langouche, G. ( Instituut voor Kern- en Stralingsfysika, Leuven University )

Potter, M. de ( Instituut voor Kern- en Stralingsfysika, Leuven University )

Van Rossum, M. ( Instituut voor Kern- en Stralingsfysika, Leuven University )

De Bruyn, J. ( Instituut voor Kern- en Stralingsfysika, Leuven University )

Dezsi, I. ( Instituut voor Kern- en Stralingsfysika, Leuven University )

Coussement, R. ( Instituut voor Kern- en Stralingsfysika, Leuven University )

さらに 1 件

掲載資料名:

Nuclear and electron resonance spectroscopies applied to materials science : proceedings of the Materials Research Society Annual Meeting, November 1980, Copley Plaza Hotel, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposia proceedings

シリーズ巻号:

3

発行年:

1981

開始ページ:

353

終了ページ:

356

出版情報:

New York, N.Y.: North Holland

ISSN:

02729172

ISBN:

9780444005977 [0444005978]

言語:

英語

請求記号:

M23500/3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018303
シリーズID:	PA00000010
会議名:	Materials Research Society Annual Meeting ; Symposium on nuclear and electron resonance spectroscopies applied to materials science
回次:	1980
会議開催地:	Boston, MA, USA
会議開催年:	1980.11.00

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