FORMATION OF BURIED EPITAXIAL Co SILICIDES BY ION IMPLANTATION

FORMATION OF BURIED EPITAXIAL Co SILICIDES BY ION IMPLANTATION

著者名:

掲載資料名:

Heterostructures on silicon : one step further with silicon

シリーズ名:

NATO ASI series. Series E, Applied sciences

シリーズ巻号:

160

発行年:

1989

開始ページ:

239

終了ページ:

245

総ページ数:

7

出版情報:

Dordrecht: Kluwer Academic Publishers

ISSN:

0168132X

ISBN:

9780792301240 [0792301242]

言語:

英語

請求記号:

N11482/160

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018242
シリーズID:	PA00000018
会議名:	NATO Advanced Research Workshop on Heterostructures on Silicon
回次:	1988
会議開催地:	Cargèse, Corsica, France
会議開催年:	1988.05.15-1988.05.20

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