Practical manufacturing technique for reducing charge-induced gate oxide degradation during ion implantation
- 著者名:
Moerschel,K.G. ( Lucent Technologies/Bell Labs. ) Possanza,W.A. Sung,J. Prozonic,M.A. Long,T. Pavlo,J. Chrapacz,T. - 掲載資料名:
- In-Line Methods and Monitors for Process and Yield Improvement
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3884
- 発行年:
- 1999
- 開始ページ:
- 65
- 終了ページ:
- 76
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434814 [0819434817]
- 言語:
- 英語
- 請求記号:
- P63600/3884
- 資料種別:
- 国際会議録
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