Defect detection strategies for chemical-mechanical polishing process in shallow-trench isolation applications
- 著者名:
- Li,J.J. ( VLSI Technology Inc./Philips Semiconductor )
- Liu,A.H.
- Hiemke,S.S.
- 掲載資料名:
- In-Line Methods and Monitors for Process and Yield Improvement
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3884
- 発行年:
- 1999
- 開始ページ:
- 36
- 終了ページ:
- 44
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434814 [0819434817]
- 言語:
- 英語
- 請求記号:
- P63600/3884
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
12
国際会議録
Mechanical Stress Characterization of Shallow Trench Isolation by Kelvin Probe Force Microscopy
MRS - Materials Research Society |