Which etchant used and whether an etching mask exists:how they make differences on convex-corner undercutting configuration and compensation criteria

Which etchant used and whether an etching mask exists:how they make differences on convex-corner undercutting configuration and compensation criteria

著者名:

Li,X. ( Nanyang Technological Univ. )
Lin,R.
Miao,J.
Bao,M.

掲載資料名:

Micromachining and microfabrication process technology V : 20-22 September, 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3874

発行年:

1999

開始ページ:

129

終了ページ:

136

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434715 [081943471X]

言語:

英語

請求記号:

P63600/3874

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018100
シリーズID:	PA00000029
会議名:	Micromachining and Microfabrication : Micromachining and microfabrication process technology
回次:	1999 : 5th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.09.20-1999.09.22

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