High-throughput NGL electron-beam direct-write lithography system
- 著者名:
- Parker,N.W. ( Ion Diagnostics,Inc. )
- Brodie,A.D.
- McCoy,J.H.
- 掲載資料名:
- Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3997
- 発行年:
- 2000
- 開始ページ:
- 713
- 終了ページ:
- 720
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436153 [0819436151]
- 言語:
- 英語
- 請求記号:
- P63600/3997
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
国際会議録
Direct-write electron-beam lithography for submicron integrated circuit fabrication (Invited Paper)
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS-Materials Research Society |
SPIE-The International Society for Optical Engineering |