Resist technologies for ion projection lithography(IPL)stencil maskmaking
- 著者名:
Irmscher,M. ( lnstitut fur Mikroelektronik Chips ) Butschke,J. Elian,K. Hoefflinger,B. Kragler,K. Letzkus,F. Ochsenhirt,J. Reuter,C. Springer,R. - 掲載資料名:
- Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3997
- 発行年:
- 2000
- 開始ページ:
- 362
- 終了ページ:
- 372
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436153 [0819436151]
- 言語:
- 英語
- 請求記号:
- P63600/3997
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
12
国際会議録
Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ)
SPIE-The International Society for Optical Engineering |