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Thin film dielectrics for electronics using combustion chemical vapor deposition

著者名:
Lin, W-Y.
Huang, H.
Cullen, D. K.
Shoup, S. S.
Cousins, D.
Schmitt, J. J.
Hunt, A. T.
Romanofsky, R. R.
VanKeuls, F. W.
Miranda, F. A.
Mueller, C. H.
さらに 6 件
掲載資料名:
Multicomponent oxide films for electronics : symposium held April 6-8, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
574
発行年:
1999
開始ページ:
371
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994812 [1558994815]
言語:
英語
請求記号:
M23500/574
資料種別:
国際会議録

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