HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES

HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES

著者名:

Verhaverbeke, S.

掲載資料名:

Surface chemical cleaning and passivation for semiconductor processing

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

315

発行年:

1993

開始ページ:

457

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992139 [1558992138]

言語:

英語

請求記号:

M23500/315

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018004
シリーズID:	PA00000011
会議名:	Symposium on surface chemical cleaning and passivation for semiconductor processing ; Materials Research Society Spring Meeting
回次:	1993
会議開催地:	San Francisco, California, USA
会議開催年:	1993.04.13-1993.04.15

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2 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	8 国際会議録 *CLEANING OF METAL CONTAMINATION Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M. Electrochemical Society
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