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A LOW-TEMPERATURE PROCESS FOR DEVICE QUALITY Si/SiO2 INTERFACES ON Si(111)

著者名:
Yasuda, T.
Lee, D. R.
Bjorkman, C. H.
Ma, Y.
Lucovsky, G.
Emmerichs, U.
Meyer, C.
Leo, K.
Kurz, H.
さらに 4 件
掲載資料名:
Surface chemical cleaning and passivation for semiconductor processing
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
315
発行年:
1993
開始ページ:
375
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
言語:
英語
請求記号:
M23500/315
資料種別:
国際会議録

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