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EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING

著者名:
Park, H.-H.
Kwon, K.-H.
Lee, S.-H.
Nahm, S.
Lee, J.-W.
Koak, B.-H.
Suh, K.-S.
Kwon, O.-J.
Lee, J.-L.
Yeom, G.-Y.
さらに 5 件
掲載資料名:
Surface chemical cleaning and passivation for semiconductor processing
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
315
発行年:
1993
開始ページ:
243
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
言語:
英語
請求記号:
M23500/315
資料種別:
国際会議録

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