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NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES

著者名:
Heyns, M. M.
Verhaverbeke, S.
Meuris, M.
Mertens, P. W.
Schmidt, H.
Kubota, M.
Philipossian, A.
Dillenbeck, K.
Graf, D.
Schnegg, A.
Blank, R. de
さらに 6 件
掲載資料名:
Surface chemical cleaning and passivation for semiconductor processing
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
315
発行年:
1993
開始ページ:
35
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
言語:
英語
請求記号:
M23500/315
資料種別:
国際会議録

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1 国際会議録 Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides

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2 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY

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8 国際会議録 In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements

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3 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

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9 国際会議録 SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

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