Transient Enhanced Diffusion for Ultra Low Energy Boron, Phosphorus, and Arsenic Implantation in Silicon
- 著者名:
- 掲載資料名:
- Silicon front-end technology--materials processing and modelling, symposium held April 13-15, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 532
- 発行年:
- 1998
- 開始ページ:
- 35
- 出版情報:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994386 [1558994386]
- 言語:
- 英語
- 請求記号:
- M23500/532
- 資料種別:
- 国際会議録
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