Low-Temperature (450｡？ Poly-Si Thin Film Deposition on SiO2 and Glass Using a Microcrystalline-Si Seed Layer

Low-Temperature (450｡？ Poly-Si Thin Film Deposition on SiO2 and Glass Using a Microcrystalline-Si Seed Layer

著者名:

掲載資料名:

Polycrystalline thin films : structure, texture, properties and applications III : symposium held March 31-April 3, 1997, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

472

発行年:

1997

開始ページ:

427

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993761 [1558993762]

言語:

英語

請求記号:

M23500/472

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017993
シリーズID:	PA00000011
会議名:	Polycrystalline thin films-structure, texture, properties and applications
回次:	3rd
会議開催地:	San Francisco, California, U.S.A.
会議開催年:	1997.03.31-1997.04.03

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