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Sub-Half Micron Elevated Source/Drain NMOSFETS by Low Temperature Selective Epitaxial Deposition

著者名:
Sun, J.
Bartholomew, R. F.
Bellur, K.
O'Neil, P. A.
Srivastava, A.
Violette, K. E.
Ozturk, M. C.
Osburn, C. M.
Masnari, N. A.
さらに 4 件
掲載資料名:
Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
429
発行年:
1996
開始ページ:
343
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993327 [1558993320]
言語:
英語
請求記号:
M23500/429
資料種別:
国際会議録

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