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Indluence of Interfacial Copper on the Ti-SiO2 Reaction during Nitridatin of Cu-Ti Films

著者名:
Adams, Daniel
Alford, T. L.
Theodore, N. D.
Laursen, T.
Russell, S. W.
Kim, M. J.
さらに 1 件
掲載資料名:
Thermodynamics and kinetics of phase transformations : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
398
発行年:
1996
開始ページ:
631
出版情報:
Pittsburgh, Penn.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993013 [1558993010]
言語:
英語
請求記号:
M23500/398
資料種別:
国際会議録

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