SEMICONDUCTOR NANOCRYSTALS FORMED IN SiO2 BY ION IMPLANTATION

SEMICONDUCTOR NANOCRYSTALS FORMED IN SiO2 BY ION IMPLANTATION

著者名:

掲載資料名:

Microcrystalline and nanocrystalline semiconductors : Symposium held November 29-December 2, 1994, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

358

発行年:

1995

開始ページ:

175

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992597 [1558992596]

言語:

英語

請求記号:

M23500/358

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017983
シリーズID:	PA00000011
会議名:	Symposium on microcrystalline and nanocrystalline semiconductors
回次:	1994
会議開催地:	Boston, MA, USA
会議開催年:	1994.11.29-1994.12.02

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