GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE

GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE

著者名:

掲載資料名:

Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

334

発行年:

1994

開始ページ:

3

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992337 [1558992332]

言語:

英語

請求記号:

M23500/334

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017981
シリーズID:	PA00000011
会議名:	Symposium on gas-phase and surface chemistry in electronic materials processing
回次:	1993
会議開催地:	Boston, MA, USA
会議開催年:	1993.11.29-1993.12.02

類似資料:

1 国際会議録 THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION Coltrin, Michael. E., Breiland, William. G., Ho, Pauline American Institute of Chemical Engineers	7 国際会議録 MODELS OF TRANSPORT, GAS-PHASE, AND SURFACE CHEMISTRY IN DIAMOND CHEMICAL VAPOR DEPOSITION Dandy, D.S., Coltrin, M.E. Electrochemical Society
2 国際会議録 *LASER PROBES AND NUMERICAL MODELING AS PROCESS DIAGNOSTICS IN CHEMICAL VAPOR DEPOSITION Breiland, William G., Ho, Pauline, Coltrin, Michael E,, Kee, Robert J., Evans, Greg H. Materials Research Society	8 国際会議録 DIRECT MEASUREMENT OF THE REACTIVITY OF NH AND OH ON A SILICON NITRIDE SURFACE Buss, R. J., Ho, P., Fisher, E. R., Breiland, William G. MRS - Materials Research Society
3 国際会議録 Laser Diagnostics and Numerical Modelling of Si Atom Density During CVD from Silane Coltrin, M.E., Ho, P., Breiland, W.G. American Institute of Chemical Engineers	9 国際会議録 Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors Kee, Robert J., Evans, Greg H., Coltrin, Michael E. American Chemical Society
4 国際会議録 THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR Coltrin, Michael E., Breiland, William G., Evans, Gregory H., Kee, Robert J. American Institute of Chemical Engineers	10 国際会議録 LASER STUDIES OF THE SiH RADICAL/SURFACE INTERACTION DURING DEPOSITION OF A THIN A THIN FILMS Ho, Pauline, Buss, Richard J., Breilsnd, William G. Materials Research Society
5 国際会議録 Si Atom Density Profiles In a Rotating Disk CVD Reactor Ho, P., Breiland, W.G., Coltrin, M.E. Electrochemical Society	11 国際会議録 Numerical Modelling of Diamond Chemical Vapor Deposition (Invited) Coltrin, M.E., Dandy, D.S. American Institute of Chemical Engineers
6 国際会議録 LASER-EXCITED FLOURESCENCE DETECTION OF Si2 DURING SILANE CVD Breiland, W. G., Coltrin, M. E., Ho, P. North-Holland	12 国際会議録 Gas Phase and Surface Chemical Kinetics in Silicon Chemical Vapor deposition M. Koshi, K. Matsumoto Electrochemical Society

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