Initial plasma oxidation of silicon studied by real-time ellipsometry

Initial plasma oxidation of silicon studied by real-time ellipsometry

著者名:

Kitajima,M. ( National Research Institute for Metals )
Kamioka,I.
Kurashina,T.
Nakamura,K.G.

掲載資料名:

International Symposium on Polarization Analysis and Applications to Device Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2873

発行年:

1996

開始ページ:

246

終了ページ:

249

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422712 [0819422711]

言語:

英語

請求記号:

P63600/2873

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017962
シリーズID:	PA00000029
会議名:	International Symposium on Polarization Analysis and Applications to Device Technology
回次:	1996
会議開催地:	Yokohama, Japan
会議開催年:	1996.06.12-1996.06.14

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