In-situ monitor and control using fast spectroscopic ellipsometry

In-situ monitor and control using fast spectroscopic ellipsometry

著者名:

Woollam,J.A. ( J.A.Woollam Co.,Inc. )
Gao,X.
Heckens,S.
Hilfiker,J.N.

掲載資料名:

International Symposium on Polarization Analysis and Applications to Device Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2873

発行年:

1996

開始ページ:

140

終了ページ:

143

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422712 [0819422711]

言語:

英語

請求記号:

P63600/2873

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017962
シリーズID:	PA00000029
会議名:	International Symposium on Polarization Analysis and Applications to Device Technology
回次:	1996
会議開催地:	Yokohama, Japan
会議開催年:	1996.06.12-1996.06.14

類似資料:

1 国際会議録 Spectroscopic Ellipsometry in Optical Coatings Manufacturing J.N. Hilfiker, J.S. Hale, B.D. Johs, T.E. Tiwald, R.A. Synowicki, C.L. Bungay, J.A. Woollam Society of Vacuum Coaters	7 国際会議録 IN SITU STUDIES OF ELECTRON CYCLOTRON RESONANCE PLASMA ETCHING OF SEMICONDUCTORS BY SPECTROSCOPIC ELLIPSOMETRY Nafis, S., Ianno, N.J., Snyder, Paul G., Woollam, John A., Johs, Blaine Materials Research Society
2 国際会議録 Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control J.N. Hilfiker, B. Johs, J. Hale, C.M. Herzinger, T.E. Tiwald, C.L. Bungay, R.A. Synowicki, G.K. Pribil, J.A. Woollam Society of Vacuum Coaters	8 国際会議録 Refractive index measurements of photoresist and antireflective coatings with variable-angle spectroscopic ellipsometry Synowicki,R.A., Hilfiker,J.N., Dammel,R.R., Henderson,C.L. SPIE-The International Society for Optical Engineering
3 国際会議録 In-Situ and Ex-Situ Characterization of Magneto-Optic Materials Deposited Electrochemically Hilfiker, J.N., Woollam, J.A. Electrochemical Society	9 国際会議録 Variable angle spectroscopic ellipsomefry in the vacuum ultraviolet Woollam,J.A., Hilfiker,J.N., Tiwald,T.E., Bungay,C.L., Synowicki,R.A., Meyer,D.E., Herzinger,C.M., Pfeiffer,G.L., … SPIE-The International Society for Optical Engineering
4 国際会議録 Application of spectroscopic ellipsometry to characterization of optical thin films (Invited Paper) Woollam, J.A., Bungay, C.L., Yan, L., Thompson, D.W., Hilfiker, J.N. SPIE-The International Society for Optical Engineering	10 国際会議録 In Situ Control of Wet Etching Using Spectroscopic Ellipsometry Cho, S-J., Snyder, P. G. MRS - Materials Research Society
5 国際会議録 Spectroscopic ellipsometry applications in photomask technology R. A. Synowicki, J. N. Hilfiker Society of Photo-optical Instrumentation Engineers	11 国際会議録 Recent developments in spectroscopic ellipsometry for in-situ applications Johs,B.D., Hale,J., Ianno,N.J., Herzinger,C.M., Tiwald,T.E., Woollam,J.A. SPIE-The International Society for Optical Engineering
6 国際会議録 Spectroscopic Ellipsometry Methods for Thin Absorbing Coatings J.N. Hilfiker, R.A. Synowicki, H.G. Tompkins Society of Vacuum Coaters	12 国際会議録 Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry:157 nm and below Hilfiker,J.N., Singh,B., Synowicki,R.A., Bungay,C.L. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12